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Surface and Interface Analysis

Volumn 31, Issue 8, 2001, Pages 761-767

The chemical state vector: A new concept for the characterization of oxide interfaces

(4) Barranco, A a Yubero, F a Espinos J P a Gonzalez Elipe A R a

a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA (Spain)

Author keywords

Al2O3; Auger parameter; Chemical state vector; Cu2O; CuO; Oxide thin film; Oxide oxide interfaces; SiO2; SnO; SnO2; TiO2; Wagner plot; XPS

Indexed keywords

BINDING ENERGY; DEPOSITION; KINETIC ENERGY; OXIDES; SILICON; X RAY PHOTOELECTRON SPECTROSCOPY; ZEOLITES;

AUGER PARAMETER; CHEMICAL STATE VECTOR; ELECTRONIC PARAMETERS; PHYLLOSILICATE; WAGNER PLOT;

INTERFACES (MATERIALS);

EID: 0035419754 PISSN: 01422421 EISSN: None Source Type: Journal
DOI: 10.1002/sia.1107 Document Type: Article

Times cited : (11)

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