Determination of X-ray photoelectric absorption of Ge and Si avoiding solid-state effects

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 179, Issue 3, 2001, Pages 325-333

  Baltazar Rodrigues, J ^a   Cusatis, C ^a  

^a FEDERAL UNIVERSITY OF PARANÁ   (Brazil)

Author keywords

Silicon germanium; Solid state X ray attenuation effects; X ray absorption; X ray attenuation; X ray diffraction; X ray photoelectric interaction

Indexed keywords

ELECTROMAGNETIC WAVE ABSORPTION; ELECTROMAGNETIC WAVE ATTENUATION; PHOTOELECTRICITY; QUANTUM ELECTRONICS; SILICON; THERMAL DIFFUSION; X RAY DIFFRACTION; X RAY SCATTERING;

THERMAL DIFFUSE SCATTERING;

GERMANIUM;

EID: 0035418639     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)00583-3     Document Type: Article

References (24)