Electrical properties of Ni-Cr-N thin films deposited by multitarget reactive sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 8, 2001, Pages 5091-5094

  Sato, Y ^a   Watanabe, M ^a   Sato, S ^a  

^a AKITA UNIVERSITY   (Japan)

Author keywords

Electrical property; Gage factor; Ni Cr N; Sputtering; TCR; Thin film

Indexed keywords

GAGES; LATTICE CONSTANTS; MAGNETRON SPUTTERING; NITROGEN COMPOUNDS; RADIO FREQUENCY AMPLIFIERS; SPUTTER DEPOSITION; THERMAL EFFECTS;

MULTITARGET REACTIVE SPUTTERING; TEMPERATURE COEFFICIENT RESISTANCE (TCR);

THIN FILMS;

EID: 0035414521     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.5091     Document Type: Article

References (6)