Crystallisation of Ge nanoclusters in SiO2 caused by electron irradiation in TEM

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 179, Issue 2, 2001, Pages 209-214

  Klimenkov, M ^a   Matz, W ^a   Nepijko, S A ^b   Lehmann, M ^c  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

^b INSTITUTE OF PHYSICS   (Ukraine)

^c DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

Crystallisation; Germanium nanocluster; Transmission electron microscopy

Indexed keywords

CRYSTALLIZATION; ELECTRON IRRADIATION; ION IMPLANTATION; NANOSTRUCTURED MATERIALS; SILICA; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; TWINNING;

NANOCLUSTERS;

SEMICONDUCTING GERMANIUM;

EID: 0035399627     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)00452-9     Document Type: Article

References (16)