La1-xBaxMnOz thin film growth by ion beam sputtering: Effects of oxygen partial pressure

Journal of Crystal Growth

Volumn 229, Issue 1, 2001, Pages 415-418

  Tada, M ^a   Yamada, J ^a   Srinivasu, V V ^a   Sreedevi, V ^a   Kohmoto, H ^a   Hashizume, A ^a   Inamori, Y ^a   Tanaka, T ^b   Harrou, A ^c   Nogues J ^c   Munoz J S ^c   Colino, J M ^d   Endo, T ^a  

^a MIE UNIVERSITY   (Japan)

^b TOBA NATIONAL COLLEGE OF MARITIME TECHNOLOGY   (Japan)

^c UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

^d UNIVERSITY OF CASTILLA LA MANCHA   (Spain)

Author keywords

A1. Nucleation; A3. Physical vapor deposition processes; B1. Manganites; B1. Perovskites; B2. Magnetic materials

Indexed keywords

CRYSTAL STRUCTURE; FILM GROWTH; ION BEAMS; LANTHANUM COMPOUNDS; MAGNESIA; NUCLEATION; OXYGEN; PARTIAL PRESSURE; PEROVSKITE; PHYSICAL VAPOR DEPOSITION; PRESSURE EFFECTS; SPUTTERING; X RAY CRYSTALLOGRAPHY;

ION BEAM SPUTTERING; LANTHANUM BARIUM MANGANITES;

MAGNETIC THIN FILMS;

EID: 0035398775     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0248(01)01192-7     Document Type: Article

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