Mapping of local stress distributions in SiGe/Si optical channel waveguide

Journal of Applied Physics

Volumn 90, Issue 1, 2001, Pages 276-282

  Rho, H ^a,c   Jackson, Howard E ^a   Weiss, B L ^b  

^a UNIVERSITY OF CINCINNATI   (United States)

^b UNIVERSITY OF SURREY   (United Kingdom)

^c University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035395363     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1376420     Document Type: Article

References (20)

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