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Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 4, 2001, Pages 1207-1212

Surface processing with gas-cluster ions to improve giant magnetoresistance films

(7) Fenner, D B a Hautala, J a Allen, L P a Tetreault, T G a Al Jibouri, A b Budnick, J I c Jones, K S d

a Epion Corporation (United States)

b Nordiko Limited (United Kingdom)

c UNIVERSITY OF CONNECTICUT (United States)

d University of Florida (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; COERCIVE FORCE; GIANT MAGNETORESISTANCE; ION BEAMS; LOW TEMPERATURE OPERATIONS; MAGNETIC HYSTERESIS; MAGNETIC PROPERTIES; MICROSTRUCTURE; SILICON WAFERS; SURFACE ROUGHNESS; TANTALUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

GAS CLUSTER IONS; MAGNETORESISTANCE FILMS;

MAGNETIC THIN FILMS;

EID: 0035393667 PISSN: 07342101 EISSN: None Source Type: Journal
DOI: 10.1116/1.1349193 Document Type: Article

Times cited : (14)

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