Heat and mass transfer phenomenon from an oxygen plasma to a semiconductor surface

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 959-963

  Guyon, C ^a   Cavadias, S ^a   Amouroux, J ^a  

^a SORBONNE UNIVERSITÉ   (France)

Author keywords

Catalycity; Oxygen; Plasma; Recombination; Semiconductors; Surface

Indexed keywords

ACTIVATION ENERGY; ENERGY GAP; ENERGY TRANSFER; MASS TRANSFER; OXYGEN; SEMICONDUCTOR MATERIALS;

PLASMA REACTORS;

HEAT TRANSFER;

CATALYST; HEAT TRANSFER; MASS TRANSFER; PLASMA TREATMENT;

EID: 0035387844     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01125-2     Document Type: Article

References (18)

1. Recombination of oxygen atoms on oxides surfaces