Production of low electron temperature ECR plasma for thin film deposition

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 546-550

  Itagaki, Naho ^a   Ueda, Yoko ^a   Ishii, Nobuo ^b   Kawai, Yoshinobu ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b TOKYO ELECTRON LTD   (Japan)

Author keywords

Electron cyclotron resonance plasma; Ion bombardment energy; Low electron temperature plasma; Plasma CVD

Indexed keywords

DEPOSITION; MAGNETIC FIELD EFFECTS; PLASMAS; SUBSTRATES; THERMAL EFFECTS; THIN FILMS;

ELECTRON TEMPERATURE;

ELECTRON CYCLOTRON RESONANCE;

PLASMA TREATMENT;

EID: 0035387820     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01204-X     Document Type: Article

References (10)