Properties of tungsten coatings deposited onto the fine grain graphite by different methods

Surface and Coatings Technology

Volumn 142-144, Issue , 2001, Pages 733-737

  Maier, H ^a   Luthin, J ^a   Balden, M ^a   Linke, J ^b   Koch, F ^a   Bolt, H ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

^b FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

B photoelectron spectroscopy; B SEM; C arc evaporation; C Sputtering; D tungsten; X Nuclear fusion

Indexed keywords

DEPOSITION; EVAPORATION; FUSION REACTIONS; MAGNETRON SPUTTERING; THERMAL LOAD; THICKNESS MEASUREMENT;

FINE GRAIN GRAPHITE;

COATINGS;

COATING; INDUSTRIAL APPLICATION; NUCLEAR APPLICATION; SPUTTERING; TUNGSTEN;

EID: 0035386667     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01177-X     Document Type: Article

References (14)

1. Sputtering of multicomponent materials