Role of nitrogen concentration in the thermal stability of the anisotropy in FeTiN thin films

IEEE Transactions on Magnetics

Volumn 37, Issue 4 I, 2001, Pages 1776-1778

  Ding, Yunfei ^b   Byeon, Soon Cheon ^b   Alexander, Chester ^a,b  

^a IEEE   (United States)

^b University of Alabama   (United States)

Author keywords

Anisotropy; FeTiN; Target to substrate distance; Thermal stability

Indexed keywords

ANNEALING; IRON COMPOUNDS; MAGNETIC ANISOTROPY; NITROGEN; SPUTTERING; STRESS ANALYSIS; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY ANALYSIS;

REACTIVE SPUTTERING;

MAGNETIC THIN FILMS;

EID: 0035385970     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/20.950965     Document Type: Article

References (8)

1. High moment FeTiN thin films for high density recording heads
2. Microstructure and magnetism in FeTaN films deposited in the nanocrystalline state
3. k in FeTaN films
4. Dynamic measurement of the thermal stability of the magnetic anisotropy in FeTaN films
5. Magnetic and thermal properties of IrMn/FeTaN films
6. Thermally stable, soft FeXN thin films
7. Magnetostriction in FeTaN thin films
8. XPS study of polycrsystalline and epitaxial FeTaN films deposited by d.c. reactive magnetron sputtering