Research on fabrication of 128×128 element GaAs concave microlenses array device

Zhongguo Jiguang/Chinese Journal of Lasers

Volumn 28, Issue 6, 2001, Pages 530-532

  He, Miao ^a   Yi, Xin Jian ^a   Cheng, Zu Hai ^a   Chen, Si Hai ^a   Cheng, Zhi Jun ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Ar ion beam milling; Concave microlenses array; GaAs

Indexed keywords

ARRAYS; MASKS; PHOTOLITHOGRAPHY; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE MEASUREMENT;

CONCAVE MICROLENSES ARRAY; ION BEAM ETCHING;

MICROLENSES;

EID: 0035381827     PISSN: 02587025     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (4)

1. Etching selectivity control during resist pattern transfer into silicon for the fabrication of microlenses with reduced spherical aberration
2. Dry etching for coherent refractive microlens arrays
3. Effect of refractive microlens array fabrication parameters on optical quality
4. Single-step fabrication of refractive microlens arrays