Study on thermal crosslinking reaction of o-naphthoquinone diazides and application to electrodeposition positive photoresist

Progress in Organic Coatings

Volumn 42, Issue 1-2, 2001, Pages 20-28

  Miyagawa, Kenji ^a   Naruse, Keisuke ^a   Ohnishi, Shinsuke ^a   Yamaguchi, Koji ^a   Seko, Kenji ^a   Numa, Nobushige ^a   Iwasawa, Naozumi ^a  

^a KANSAI PAINT CO LTD   (Japan)

Author keywords

Crosslinking reaction; Electrodeposition; Hydroxyl group; Indenecarboxylic acid; o naphthoquinone diazide; Photochemical reaction acrylic polymer; Positive photoresist; Post exposure bake; Printed circuit board; Thermal reaction

Indexed keywords

ACRYLICS; CROSSLINKING; ELECTRODEPOSITION; PHOTORESISTS; THERMODYNAMICS; ULTRAVIOLET RADIATION;

NAPHTHOQUINONE DIAZIDES;

OPTICAL COATINGS;

EID: 0035370181     PISSN: 03009440     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0300-9440(01)00155-2     Document Type: Article

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