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EPJ Applied Physics
Volumn 14, Issue 3, 2001, Pages 199-231
Precise in situ measurements of isotopic abundances with pulse counting of sputtered ions
(4)
Slodzian, G
a
Chaintreau, M
a
Dennebouy, R
a
Rousse, A
a
a
UNIVERSITÉ PARIS SUD
(
France
)
Author keywords
[No Author keywords available]
Indexed keywords
ADAPTIVE OPTICS; CESIUM; CHARGED PARTICLES; ION BEAMS; ION BOMBARDMENT; IONIZING RADIATION; QUANTUM THEORY; SEMICONDUCTING SILICON; SPUTTER DEPOSITION;
ELECTRON MULTIPLIER; IN SITU MEASUREMENTS; ISOTOPIC RATIO; PULSE HEIGHT DISTRIBUTIONS; QUASI SIMULTANEOUS ARRIVALS; SPUTTERED IONS; TERRESTRIAL ISOTOPIC FRACTIONATION LINE;
ELECTROMAGNETIC FIELD MEASUREMENT;
EID
:
0035365566
PISSN
:
12860042
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1051/epjap:2001160
Document Type
:
Article
Times cited : (
43
)
References (
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.