Molecular dynamics simulation of fluorine ion etching of silicon

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 180, Issue 1-4, 2001, Pages 317-321

  Chiba, S ^a   Aoki, T ^a   Matsuo, J ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Fluorine; Molecular dynamics; Silicon

Indexed keywords

COMPUTER SIMULATION; DESORPTION; DIFFUSION IN SOLIDS; ETCHING; FLUORINE; ION BOMBARDMENT; MOLECULAR DYNAMICS;

ION ETCHING;

SEMICONDUCTING SILICON;

EID: 0035362639     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(01)00438-4     Document Type: Conference Paper

References (9)