Photo-electrochemical deposition of platinum on TiO2 with resolution of twenty nanometers using a mask elaborated with electron-beam lithography

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 6 A, 2001, Pages 4246-4251

  Juodkazis, Saulius ^a,b   Yamaguchi, Akira ^a   Ishii, Hidekazu ^a   Matsuo, Shigeki ^a   Takagi, Hitoshi ^a   Misawa, Hiroaki ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

^b VILNIUS UNIVERSITY   (Lithuania)

Author keywords

Laser assisted deposition; Microfabrication; Platinum; Titania

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRON BEAM LITHOGRAPHY; ELECTRONS; LASER APPLICATIONS; MASKS; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TITANIUM DIOXIDE;

LASER ASSISTED DEPOSITION; MICROCHEMICAL ANALYSIS; MICROFABRICATION; PHOTOELECTROCHEMICAL DEPOSITION;

PLATINUM;

EID: 0035358694     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.4246     Document Type: Article

References (20)

1. Nanoparticles in Solids and Solutions