Giant magnetoresistance in ion beam deposited spin-valve films with specular enhancement

Journal of Applied Physics

Volumn 89, Issue 11 II, 2001, Pages 6931-6933

  Sant, S ^a   Mao, M ^b   Kools, J ^a   Koi, K ^c   Iwasaki, H ^c   Sahashi, M ^c  

^a VEECO INSTRUMENTS INC   (United States)

^b LAWRENCE LIVERMORE NATIONAL LABORATORY   (United States)

^c TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035356190     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1356718     Document Type: Article

References (4)

1. W. F. Egelhoff, Jr., P. J. Chen, C. J. Powell, M. D. Stiles, R. R. McMichael, J. H. Judy, K. Takano, and A. E. Berkowitz, J. Appl. Phys. 82, 6142 (1997).
2. H. J. M. Swagten, G. J. Strijkers, P. J. H. Bleomen, M. M. H. Willekens, and W. J. M. de Jonge, J. Appl. Phys. 53, 9108 (1996).
3. Y. Kamiguchi, H. Yuasa, H. Fukuzawa, K. Koi, H. Iwasaki, and M. Sahashi. Digest of INTERMAG 99, 1999, paper DB-01.
4. M. Mao (unpublished).