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International Journal of Refractory Metals and Hard Materials

Volumn 19, Issue 3, 2001, Pages 169-175

Search for scaling parameters for growth rate and purity of hot-filament CVD diamond

(3) Heimann, Burkhard a,b Raiko, Vadim a,c Buck, Volker a

a UNIVERSITY OF DUISBURG ESSEN (Germany)

b UNIVERSITY OF WUPPERTAL (Germany)

c Plast Control (Germany)

Author keywords

Diamond growth and characterization; Hot filament CVD; Scaling parameters

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MIXTURES; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; TERNARY SYSTEMS;

DIAMOND GROWTH; SCALING PARAMETERS;

DIAMOND FILMS;

EID: 0035343071 PISSN: 02634368 EISSN: None Source Type: Journal
DOI: 10.1016/S0263-4368(01)00019-1 Document Type: Article

Times cited : (14)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.