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Intermetallics

Volumn 9, Issue 5, 2001, Pages 443-449

Oxidation behavior of TiAl protected by Si + Nb combined ion implantation

(7) Li, X Y a Taniguchi, S b Zhu, Y C a Fujita, K a Iwamoto, N a Matsunaga, Y c Nakagawa, K c

a Ion Eng Res Institute Corporation (Japan)

b OSAKA UNIVERSITY (Japan)

c IHI CORPORATION (Japan)

Author keywords

A. Titanium aluminides, based on TiAl; B. Oxidation; C. Surface finishing; F. Ion beam methods

Indexed keywords

ALUMINA; AUGER ELECTRON SPECTROSCOPY; BINARY ALLOYS; CARBON; ELECTRIC POTENTIAL; INTERMETALLICS; ION BEAMS; ION IMPLANTATION; NIOBIUM; OXIDATION RESISTANCE; PROTECTIVE COATINGS; SCANNING ELECTRON MICROSCOPY; SILICON; THERMOOXIDATION; X RAY DIFFRACTION ANALYSIS;

TITANIUM ALUMINIDE;

TITANIUM ALLOYS;

EID: 0035340903 PISSN: 09669795 EISSN: None Source Type: Journal
DOI: 10.1016/S0966-9795(01)00024-3 Document Type: Article

Times cited : (50)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.