Excess currents induced by hot hole injection and FN electron injection in thin SiO2 films

IEEE Transactions on Electron Devices

Volumn 48, Issue 5, 2001, Pages 868-873

  Teramoto, Akinobu ^a   Kobayashi, Kiyoteru ^a   Ohno, Yoshikazu ^a   Shigetomi, Akira ^a  

^a MITSUBISHI ELECTRIC CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; ELECTRONS; HOLE TRAPS; INTERFACES (MATERIALS); LEAKAGE CURRENTS; PARTICLE BEAM INJECTION; STRESSES; THIN FILMS;

FIELD ENHANCEMENT; FOWLER-NORDHEIM ELECTRON INJECTION; HOT HOLE INJECTION; THIN SILICA FILMS; TRAP ASSISTED TUNNELING;

SILICA;

EID: 0035340857     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.918233     Document Type: Article

References (33)