The development of instrumentation for thin-film X-ray diffraction

Journal of Chemical Education

Volumn 78, Issue 5, 2001, Pages 613-616

  Ryan, Tom ^a,b  

^a Malvern Instruments Inc   (United States)

^b EMCORE CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035337909     PISSN: 00219584     EISSN: None     Source Type: Journal    
DOI: 10.1021/ed078p613     Document Type: Conference Paper

References (8)

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4. Bowen, D. K.; Tanner, B. K. High Resolution X-Ray Diffraction and Topography; Taylor and Francis: London, 1998.
5. Schuster, M.; Gobel, H.; Siemens, A. G. J. Phys., D 1995, 28, A270-A275.
6. Parrat, L. G. Phys Rev. 1954, 95, 359.
7. Stommer, R.; Gobel, H.; Martin, A. R.; Hub, W.; Pietsch, U. Semiconductor Int. 1998, 21 (5), 81-88.
8. Houtman, E.; Ryan, T. W.; David, B.; Dormann, V. Adv. X-Ray Anal. 1992, 35, 205-210.