Contamination of silicon surface due to contact with solid polymers

IEEE Transactions on Semiconductor Manufacturing

Volumn 14, Issue 2, 2001, Pages 85-96

  Iyer, Nandini ^a   Saka, Nannaji ^b   Chun, Jung Hoon ^b  

^a IntelliSense Corporation   (United States)

^b Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Backside contamination; Semiconductor fabrication; Tribology

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTAMINATION; ELASTIC MODULI; HARDNESS; IMAGE ANALYSIS; OPTICAL MICROSCOPY; PLASTIC DEFORMATION; POLYMERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON; TRIBOLOGY;

COMPUTER IMAGE ANALYSIS; HERTZ CONTACT AREA;

SURFACE PHENOMENA;

EID: 0035337514     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/66.920718     Document Type: Article

References (16)