Fabrication of Ti/TiO2/MOx electrodes using photoelectrodeposition technique

Electrochemistry

Volumn 69, Issue 5, 2001, Pages 314-318

  Matsumoto, Y ^a   Noguchi, M ^a   Matsunaga, T ^a   Kamada, K ^a   Koinuma, M ^a   Yamada, S ^a  

^a KUMAMOTO UNIVERSITY   (Japan)

Author keywords

Electrodeposition; Lead dioxide; Ruthenium oxide; Titanium dioxide film

Indexed keywords

ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; FABRICATION; FERMI LEVEL; INTERFACES (MATERIALS); IONS; SUBSTRATES; THIN FILMS;

PHOTOELECTRODEPOSITION TECHNIQUES; TUNNELING CURRENTS;

TITANIUM COMPOUNDS;

EID: 0035329604     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.69.314     Document Type: Article

References (31)