Polycrystalline Ni ferrite films deposited by RF sputtering techniques

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 5 A, 2001, Pages 3176-3179

  Samarasekara, P ^a   Cadieu, F J ^b  

^a UNIVERSITY OF RUHUNA   (Sri Lanka)

^b CITY UNIVERSITY OF NEW YORK   (United States)

Author keywords

Anisotropy; Coercivity; Hysteresis loops; Magnetic films; Sputtering; Stress

Indexed keywords

ANISOTROPY; COERCIVE FORCE; FERRITE; HYSTERESIS; NICKEL COMPOUNDS; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

FERRITE FILMS;

POLYCRYSTALLINE MATERIALS;

EID: 0035328629     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.3176     Document Type: Article

References (18)