|
|
Volumn 16, Issue 5, 2001, Pages 362-366
|
|
Thermal-annealing-induced effects in chemically deposited cobalt sulphide thin films
|
|
Author keywords
[No Author keywords available]
|
|
Indexed keywords
ACTIVATION ENERGY;
ANNEALING;
COBALT COMPOUNDS;
DEPOSITION;
ELECTRIC CONDUCTIVITY;
ENERGY DISPERSIVE SPECTROSCOPY;
PHASE TRANSITIONS;
STOICHIOMETRY;
TEMPERATURE;
X RAY DIFFRACTION ANALYSIS;
ABSORPTION COEFFICIENT;
BAND-TO-BAND TRANSITIONS;
THERMAL TRANSFORMATION;
X RAY FLUORESCENCE;
THIN FILMS;
|
|
EID: 0035326741
PISSN: 02681242
EISSN: None
Source Type: Journal
DOI: 10.1088/0268-1242/16/5/314 Document Type: Article |
|
Times cited : (8)
|
|
References (19)
|
