Effects of oxygen flooding on crater bottom composition and roughness in ultrashallow secondary ion mass spectrometry depth profiling

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 3, 2001, Pages 829-835

  Ng, C M ^a   Wee, A T S ^a   Huan, C H A ^a   See, A ^b  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^b CHARTERED SEMICONDUCTOR MANUFACTURING LTD   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ION IMPLANTATION; OXIDATION; PARTIAL PRESSURE; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; SPUTTERING; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRATER BOTTOM COMPOSITION;

OXYGEN;

EID: 0035326277     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1368680     Document Type: Conference Paper

References (29)

1. W. Vandervorst and F. R. Shepherd, J. Vac. Sci. Technol. A 5, 313 (1987).
2. P. F. A. Alkemade, Z. X. Jiang, C. C. G. Visser, S. Radelaar, and W. M. Arnoldbik, J. Vac. Sci. Technol. B 16, 373 (1998).
3. R. G. Wilson, F. A. Stevie, and C. W. Magee, Secondary Ion Mass Spectrometry (Wiley, New York, 1989), Chaps. 1 and 2.
4. K. Elst and W. Vandervorst, in Secondary Ion Mass Spectrometry, SIMS IX, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley, Chichester, 1994), p. 742.
5. M. Moens, F. Adams, and D. S. Simons, Anal. Chem. 59, 1518 (1987).
6. P. C. Zalm and C. J. Vriezema, Nucl. Instrum. Methods Phys. Res. B 64, 626 (1992).
7. J. W. Erickson and R. Brigham, J. Vac. Sci. Technol. B 14, 353 (1996).
8. S. S. Todorov, I. R. Chakarov, V. Miteva, D. S. Karpuzov, D. V. Klyachko, V. V. Uvarov, and V. Shinkorenko, Surf. Sci. 271, 641 (1992).
9. A. Terrasi, J. Almeida, C. Coluzza, and G. Margaritondo, Nucl. Instrum. Methods Phys. Res. B 116, 416 (1996).
10. K. Elst, W. Vandervorst, J. Alay, J. Snauwaert, and L. Hellemans, J. Vac. Sci. Technol. B 16, 1968 (1993).
11. H. De Witte, T. Conard, R. Sporken, R. Gouttebaron, R. Magnée, W. Vandervorst, R. Caudano, and R. Gijbels, in Secondary Ion Mass Spectrometry, SIMS XII, edited by A. Benninghoven, P. Bertrand, H.-N. Migeon, and H. W. Werner (Elsevier, Amsterdam, 2000), p. 73.
12. J. S. Williams, K. T. Short, M. Petravic, and B. G. Svensson, Nucl. Instrum. Methods Phys. Res. B 121, 24 (1997).
13. J. Alay and W. Vandervorst, Surf. Interface Anal. 19, 313 (1992).
14. K. Wittmaack and S. F. Corcoran, J. Vac. Sci. Technol. B 16, 272 (1998).
15. Z. X. Jiang and P. F. A. Alkemade, J. Vac. Sci. Technol. B 16, 1971 (1998).
16. Z. X. Jiang and P. F. A. Alkemadé, Appl. Phys. Lett. 73, 315 (1998).
17. M. Niwano, H. Katakura, Y. Takakuwa, and N. Miyamoto, J. Appl. Phys. 68, 5576 (1990).
18. F. A. Stevie, P. M. Kahora, D. S. Simons, and P. Chi, J. Vac. Sci. Technol. A 6, 76 (1988).
19. K. Wittmaack, J. Vac. Sci. Technol. A 8, 2246 (1990).
20. K. Wittmaack, J. Vac. Sci. Technol. B 16, 2776 (1998).
21. K. Elst, W. Vandervorst, H. Bender, and J. Alay, in Secondary Ion Mass Spectrometry, SIMS IX, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley, Chichester, 1994), p. 617.
22. J. M. Hill, D. G. Royce, C. S. Fadley, L. F. Wagner, and F. J. Grunthaner, Chem. Phys. Lett. 44, 225 (1976).
23. M. P. Seah, in Practical Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy, edited by D. Briggs and M. P. Seah (Wiley, Chichester, 1983), p. 211.
24. A. James and M. Lord, Index of Chemical and Physical Data (Macmillan, New York, 1992), p. 189.
25. D. A. Cole, J. R. Shallenberger, S. W. Novak, R. L. Moore, M. J. Edgell, S. P. Smith, C. J. Hitzman, J. F. Kirchhoff, E. Principe, W. Nieveen, F. K. Huang, S. Biswas, R. J. Bleiler, and K. Jones, J. Vac. Sci. Technol. A 18, 440 (2000).
26. K. Elst and W. Vandervorst, J. Vac. Sci. Technol. A 12, 3205 (1994).
27. T. Hoshi, K. Miyoshi, and M. Tomita, in Secondary Ion Mass Spectrometry, SIMS IX, edited by A. Benninghoven, Y. Nihei, R. Shimizu, and H. W. Werner (Wiley, Chichester, 1994), p. 710.
28. C. Tian and W. Vandervorst, J. Vac. Sci. Technol. A 15, 452 (1997).
29. K. Wittmaack and W. Wach, Nucl. Instrum. Methods 191, 327 (1981).