Reaction and Formation of Crystalline Silicon Oxynitride in Si-O-N Systems under Solid High Pressure

Journal of the American Ceramic Society

Volumn 84, Issue 4, 2001, Pages 875-877

  Li, Ya Li ^a   Zheng, Fen ^a   Liang, Yong ^a   Ma, Xian Feng ^b   Cui, Suo Jing ^b   Ishigaki, Takamasa ^c  

^a INSTITUTE OF METAL RESEARCH   (China)

^b CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY   (China)

^c NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; CRYSTALLINE MATERIALS; HIGH PRESSURE EFFECTS; HIGH TEMPERATURE EFFECTS; OXIDATION; POWDERS; PRESSING (FORMING); SILICON NITRIDE;

AMORPHOUS SILICON NITRIDE; CRYSTALLINE SILICON OXYNITRIDE; SOLID HIGH PRESSURE;

SILICON COMPOUNDS;

EID: 0035324324     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00757.x     Document Type: Article

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