Hydrolysis Deposition of Thin Films of Antimony-Doped Tin Oxide

Journal of the American Ceramic Society

Volumn 84, Issue 4, 2001, Pages 869-871

  Tsukuma, Koji ^a   Akiyama, Tomoyuki ^b   Imai, Hiroaki ^c  

^a NEW ENERGY AND INDUSTRIAL TECHNOLOGY DEVELOPMENT ORGANIZATION   (Japan)

^b TOSOH CORPORATION   (Japan)

^c KEIO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANTIMONY; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; HYDROLYSIS; PRECIPITATION (CHEMICAL); TIN COMPOUNDS;

ANTIMONY FLUORIDE; TIN FLUORIDE; TIN OXIDE;

THIN FILMS;

EID: 0035324295     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00755.x     Document Type: Article

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