Interdiffusion in vacuum-deposited dielectric thin films

Optics Communications

Volumn 190, Issue 1-6, 2001, Pages 211-220

  Lee, Y J ^a   Lee, J H ^a   Lee, Y Y ^a   Kang, Y H ^a   Kim, Y S ^a   Kwon, S N ^b   Jeong, K ^b  

^a Dankook University   (South Korea)

^b Yonsei University   (South Korea)

Author keywords

Depth profiling; Dielectric thin films; Diffusion length; Interdiffusion; XPS sputtering

Indexed keywords

INTERDIFFUSION (SOLIDS); OPTICAL COATINGS; OPTICAL FILMS; SPUTTER DEPOSITION; THIN FILMS; VACUUM APPLICATIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

OPTICAL THIN FILMS;

DIELECTRIC FILMS;

EID: 0035312222     PISSN: 00304018     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0030-4018(01)01071-9     Document Type: Article

References (13)

1. All-dielectric high-reflecting layers
2. Problem of phase variation with wavelength in dielectric films. Extension of interferometric standards into the infrared
3. Properties of weakly absorbing multilayer systems in terms of the concept of potential transmittance
4. Multiple reflectors as narrow-band and broadband vacuum ultraviolet filters
5. Measurement of ultralow losses in an optical interferometer
6. The relationship between optical inhomogeneity and film structure
7. Optical effects of large interdiffusion in filters
8. Interdiffusion in all-dielectric Fabry-Perot filters
9. The diffusion effects on the multilayer thin-films
10. Electron spectroscopy for surface analysis