The effect of a migration barrier between tungsten oxide and indium tin oxide thin films in electrochromic devices

Thin Solid Films

Volumn 385, Issue 1-2, 2001, Pages 255-259

  Huh, J S ^a   Hwang, H R ^a   Paik, J H ^a   Lee, D D ^a   Lim, J O ^a  

^a Kyungpook National University   (South Korea)

Author keywords

Electronic devices; Indium tin oxide; Interfaces; Tungsten oxide

Indexed keywords

ELECTROCHROMIC DEVICES; ELECTROMIGRATION; INDIUM COMPOUNDS; INTERFACES (MATERIALS); TUNGSTEN COMPOUNDS;

INDIUM TIN OXIDE; TUNGSTEN OXIDE;

THIN FILMS;

EID: 0035311589     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01912-X     Document Type: Article

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