Error analysis leading to design criteria for transmission line model characterization of ohmic contacts

IEEE Transactions on Electron Devices

Volumn 48, Issue 4, 2001, Pages 758-766

  Ueng, Haw Jye ^b,c   Janes, David B ^a,b   Webb, Kevin J ^a,b  

^a IEEE   (United States)

^b PURDUE UNIVERSITY   (United States)

^c Wafertech Research and Development   (United States)

Author keywords

Contact measurement design; Contact resistance; Error analysis; Transmission line model (TLM)

Indexed keywords

CONTACT RESISTANCES; TRANSMISSION LINE MODELS (TLM);

ELECTRIC RESISTANCE; ERROR ANALYSIS; OHMIC CONTACTS; STATISTICAL METHODS;

TRANSMISSION LINE THEORY;

EID: 0035309582     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.915721     Document Type: Article

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