Reduction of photoresist usage during spin coating

Journal of Electronic Materials

Volumn 30, Issue 4, 2001, Pages 432-438

  Chou, Fu Chu ^a   Wang, Min Wen ^a   Gong, Shih Ching ^a   Yang, Zen Gi ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

Injection rate; Injection volume; Photoresist; Spin coating; Usage reduction

Indexed keywords

COMPUTER SIMULATION; FLOW VISUALIZATION; SEMICONDUCTING FILMS; SPIN COATING; WSI CIRCUITS;

INERTIA FORCE;

PHOTORESISTS;

EID: 0035306503     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-001-0055-6     Document Type: Article

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