Selective reflection spectroscopy of a resonant vapor at the interface with a metallic layer

Physical Review E - Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics

Volumn 63, Issue 4, 2001, Pages

  Chevrollier, M ^a   Oria M ^a   de Souza, J G ^a   Bloch, D ^b   Fichet, M ^b   Ducloy, M ^b  

^a FEDERAL UNIVERSITY OF PARAÍBA   (Brazil)

^b UNIVERSITÉ PARIS 13   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ANALYSIS; DIELECTRIC MATERIALS; INTERFACES (MATERIALS); METALLIC FILMS; REFLECTION; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; SUBSTRATES; VAN DER WAALS FORCES; VAPORS;

METAL-VAPOR INTERFACES; SELECTIVE REFLECTION (SR) SPECTROSCOPY;

RESONANCE;

EID: 0035305110     PISSN: 1063651X     EISSN: None     Source Type: Journal    
DOI: 10.1103/PhysRevE.63.046610     Document Type: Article

References (26)

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22. One actually calculates several thicknesses for which (Formula presented) but the attenuation of the signal is considerable, due to the large absorption over propagation in the metal film.
23. A polarization-sensitive detection may also provide a contribution of the absorptive response (see Ref. 14). In any case, such a scheme requires a nonzero incidence angle, hence implying a broadening of the sub-Doppler contribution.
24. In Fig. 33(a), the distortion looks to be a particularly weak effect, because of a line shape broadening due to the instrumental resolution.
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