Effect of HfO2 addition on sintering of Si3N4

Journal of the Ceramic Society of Japan

Volumn 109, Issue 1268, 2001, Pages 342-346

  Li, Huang ^a   Komeya, Katsutoshi ^a   Tatami, Junichi ^a   Meguro, Takeshi ^a   Chiba, Yoshihiko ^a   Komatsu, Michiyasu ^b  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b TOSHIBA CORPORATION   (Japan)

Author keywords

Densification; Hafnia; Microstructure; Phase reaction; Silicon nitride; Yttria

Indexed keywords

DENSIFICATION; ENERGY DISPERSIVE SPECTROSCOPY; EUTECTICS; PHASE TRANSITIONS; SINTERING; THERMAL EFFECTS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

PHASE REACTIONS;

SILICON NITRIDE;

EID: 0035304822     PISSN: 09145400     EISSN: None     Source Type: Journal    
DOI: 10.2109/jcersj.109.1268_342     Document Type: Article

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