Optical property changes of silica glass and sapphire induced by Cu and O implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 175-177, Issue , 2001, Pages 652-657

  Ikeyama, M ^a   Nakao, S ^a   Tazawa, M ^a   Kadono, K ^b   Kamada, K ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Ion implantation; Nano particles; Optical absorption; Sapphire; Silica glass; Third order non linear optical susceptibility

Indexed keywords

ANNEALING; COPPER; ION IMPLANTATION; LIGHT ABSORPTION; NANOSTRUCTURED MATERIALS; NONLINEAR OPTICS; OXYGEN; PARTICLE SIZE ANALYSIS; SAPPHIRE; SILICA;

THIRD-ORDER NONLINEAR OPTICAL SUSCEPTIBILITY;

SEMICONDUCTING GLASS;

EID: 0035302309     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(00)00654-6     Document Type: Conference Paper

References (10)