Numerical and experimental investigation of 2 × 2 multimode interference couplers in silica-on-silicon

Optical and Quantum Electronics

Volumn 33, Issue 4-5, 2001, Pages 387-398

  Leick, L ^a   Povlsen, J H ^a   Pedersen, R J S ^a  

^a TECHNICAL UNIVERSITY OF DENMARK   (Denmark)

Author keywords

MMI couplers; Process tolerance; Silica on silicon; Wavelength sensitivity

Indexed keywords

ELECTRON DEVICE MANUFACTURE; INTEGRATED OPTICS; INTERFEROMETERS; OPTICAL DESIGN; OPTICAL WAVEGUIDES; REFRACTIVE INDEX; STRESSES;

MACH-ZEHNDER INTERFEOMETER; MULTIMODE INTERFERENCE COUPLERS; SILICA-ON-SILICON TECHNOLOGY; WAVEGUIDE SEPARATION PROCESS TOLERANCE; WAVELENGTH SENSITIVITY;

WAVEGUIDE COUPLERS;

EID: 0035300584     PISSN: 03068919     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1010890700287     Document Type: Article

References (11)

1. Achieving small process tolerant wavelength-flattened 3 dB directional couplers in silica-on-silicon