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Volumn 8, Issue 2, 2001, Pages 475-477

XAFS studies of the formation of cobalt silicide on (√3 × √3) SiC(0001)

Author keywords

Cobalt silicide; Metal semiconductor contacts; Molecular beam epitaxy; Silicon carbide

Indexed keywords

ARTICLE;

EID: 0035288824     PISSN: 09090495     EISSN: None     Source Type: Journal    
DOI: 10.1107/S0909049500017921     Document Type: Article
Times cited : (3)

References (5)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.