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Volumn 8, Issue 2, 2001, Pages 475-477
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XAFS studies of the formation of cobalt silicide on (√3 × √3) SiC(0001)
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Author keywords
Cobalt silicide; Metal semiconductor contacts; Molecular beam epitaxy; Silicon carbide
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Indexed keywords
ARTICLE;
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EID: 0035288824
PISSN: 09090495
EISSN: None
Source Type: Journal
DOI: 10.1107/S0909049500017921 Document Type: Article |
Times cited : (3)
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References (5)
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