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Volumn 114-116, Issue , 2001, Pages 115-121

Dissociative photoionization of SiF4 around the Si 2p edge: A new TOFMS study with improved mass resolution

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON ENERGY LEVELS; MASS SPECTROMETRY; PHOTODISSOCIATION; PHOTOIONIZATION; SIGNAL TO NOISE RATIO; SYNCHROTRON RADIATION;

SILICON FLUORIDE;

SILICON COMPOUNDS;

EID: 0035276105 PISSN: 03682048 EISSN: None Source Type: Journal
DOI: 10.1016/S0368-2048(00)00311-X Document Type: Article

Times cited : (23)

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