Production of a pulsed high-density electron beam by channel spark discharge

Electrical Engineering in Japan (English translation of Denki Gakkai Ronbunshi)

Volumn 134, Issue 4, 2001, Pages 10-18

  Saeki, Masashi ^a   Matsuoka, Hideo ^b   Nagae, Yasutaro ^c   Tanaka, Minoru ^a   Omata, Kazuya ^b   Sato, Masahiro ^b  

^a CHUGOKU ELECTRIC POWER CO INC   (Japan)

^b TOSHIBA CORPORATION   (Japan)

^c NIHON UNIVERSITY   (Japan)

Author keywords

Channel spark; Hollow cathode; Pulsed electron beam; X ray

Indexed keywords

CAPACITORS; CATHODES; ELECTRIC DISCHARGES; ELECTRIC POTENTIAL; ELECTRON BEAMS; X RAYS;

CHANNEL SPARK DISCHARGES; PULSED HIGH-DENSITY ELECTRON BEAMS;

GLOW DISCHARGES;

EID: 0035272728     PISSN: 04247760     EISSN: None     Source Type: Journal    
DOI: 10.1002/1520-6416(200103)134:4<10::AID-EEJ2>3.0.CO;2-G     Document Type: Article

References (8)

1. Deposition of superconducting YBaCuO thin film by pseudospark ablation
2. Deposition by means of pulsed electron beam ablation
3. Investigation of plasma produced by laser and electron pulse ablation
4. Generation of intense pulsed electron beams by superposition of two discharge
5. Pseudospark produced pulsed electron beam for material processing
6. Pulsed intense electron beams generated in transient hollow cathode discharges: Fundamentals and applications
7. The role of multielectrode geometry in the generation of pulsed intense electron beams in preionization-controlled open-ended hollow-cathode transient discharges
8. Experimental study of the pseudospark-produced electron beam for material processing