Erratum: Aqueous-based photoresist drying using supercritical carbon dioxide to prevent pattern collapse (J. Vac. Sci. Technol. B (2000) 18 (3313))

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 2, 2001, Pages 600-

  Goldfarb, Darío L ^a   De Pablo, Juan J ^a   Nealey, Paul F ^a   Simons, John P ^b   Moreau, Wayne M ^b   Angelopoulos, Marie ^b  

^a University of Wisconsin Madison   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

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EID: 0035272341     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1358355     Document Type: Erratum

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