-
1
-
-
0031644059
-
Recent developments in conductor processing of high irreversibility field superconductors
-
and references therein
-
MacManus-Driscoll, J. L. Recent Developments in Conductor Processing of High Irreversibility Field Superconductors. Annu. Rev. Mater. Sci. 1998, 28, 421-462, and references therein.
-
(1998)
Annu. Rev. Mater. Sci.
, vol.28
, pp. 421-462
-
-
MacManus-Driscoll, J.L.1
-
2
-
-
3943097076
-
Chemical vapor deposition of copper for multilevel metallization
-
Kaloyeros, A. E.; Fury, M. A. Chemical Vapor Deposition of Copper for Multilevel Metallization. Mater. Res. Soc. Bull. 1993, 18 (6), 22-29.
-
(1993)
Mater. Res. Soc. Bull.
, vol.18
, Issue.6
, pp. 22-29
-
-
Kaloyeros, A.E.1
Fury, M.A.2
-
3
-
-
0006816043
-
Chemical vapor deposition of copper for ic metallization: Precursor chemistry and molecular structure
-
Doppelt, P.; Baum, T. H. Chemical Vapor Deposition of Copper for IC Metallization: Precursor Chemistry and Molecular Structure. Mater. Res. Soc. Bull. 1994, 19 (8), 41-48.
-
(1994)
Mater. Res. Soc. Bull.
, vol.19
, Issue.8
, pp. 41-48
-
-
Doppelt, P.1
Baum, T.H.2
-
4
-
-
0005062760
-
Sublimation behavior of tris-(2,2,6,6-tetramethyl-3,5-heptanedionato) lanthanoid (III)
-
Amano, R.; Sato, A.; Suzuki, S. Sublimation Behavior of Tris-(2,2,6,6-tetramethyl-3,5-heptanedionato)lanthanoid (III). Bull. Chem. Soc. Jpn. 1981, 54, 1368-1374.
-
(1981)
Bull. Chem. Soc. Jpn.
, vol.54
, pp. 1368-1374
-
-
Amano, R.1
Sato, A.2
Suzuki, S.3
-
5
-
-
84921241720
-
A review of metalorganic chemical vapor deposition of high-temperature superconducting thin films
-
Erbil, A.; Zhang, K.; Kwak, B. S.; Boyd, E. P. A Review of Metalorganic Chemical Vapor Deposition of High-Temperature Superconducting Thin Films. SPIE J. 1989, 1187, 104-114.
-
(1989)
SPIE J.
, vol.1187
, pp. 104-114
-
-
Erbil, A.1
Zhang, K.2
Kwak, B.S.3
Boyd, E.P.4
-
6
-
-
0004993679
-
Volatilities of precursors for chemical vapor deposition of superconducting thin films
-
Yuhya, S.; Kikuchi, K.; Yoshida, M.; Sugawara, K.; Shiohara, Y. Volatilities of Precursors for Chemical Vapor Deposition of Superconducting Thin Films. Mol. Cryst. Liq. Cryst. 1990, 184, 231-235.
-
(1990)
Mol. Cryst. Liq. Cryst.
, vol.184
, pp. 231-235
-
-
Yuhya, S.1
Kikuchi, K.2
Yoshida, M.3
Sugawara, K.4
Shiohara, Y.5
-
7
-
-
0026852185
-
Vapor Pressure of Y, Ba, Cu precursors for the growth of YBa2Cu3O7
-
Waffenschmidt, E.; Musolf, J.; Heuken, M.; Heime, K. Vapor Pressure of Y, Ba, Cu Precursors for the Growth of YBa2Cu3O7. J. Supercond. 1992, 5, 119-125.
-
(1992)
J. Supercond.
, vol.5
, pp. 119-125
-
-
Waffenschmidt, E.1
Musolf, J.2
Heuken, M.3
Heime, K.4
-
8
-
-
0027341912
-
Beta-diketonate precursors for the chemical vapor deposition of YBaCuO
-
Busch, H.; Fink, A.; Müller, A.; Samwer, K. Beta-Diketonate Precursors for the Chemical Vapor Deposition of YBaCuO. Supercond. Sci. Technol. 1993, 6, 42-45.
-
(1993)
Supercond. Sci. Technol.
, vol.6
, pp. 42-45
-
-
Busch, H.1
Fink, A.2
Müller, A.3
Samwer, K.4
-
9
-
-
30544433509
-
The vaporization behavior of boron nitride and aluminium nitride
-
Hildenbrand, D. L.; Hall, W. F. The Vaporization Behavior of Boron Nitride and Aluminium Nitride. J. Phys. Chem. 1963, 67, 888-893.
-
(1963)
J. Phys. Chem.
, vol.67
, pp. 888-893
-
-
Hildenbrand, D.L.1
Hall, W.F.2
-
10
-
-
0348113219
-
Composition of saturated beryllium chloride vapor
-
Hildenbrand, D. L.; Knight, D. T. Composition of Saturated Beryllium Chloride Vapor. J. Chem. Phys. 1969, 51, 1260-1261.
-
(1969)
J. Chem. Phys.
, vol.51
, pp. 1260-1261
-
-
Hildenbrand, D.L.1
Knight, D.T.2
-
11
-
-
36749110804
-
Effusion studies of the thermal decomposition of magnesium and calcium sulfates
-
Lau, K. H.; Cubicciotti, D.; Hildenbrand, D. L. Effusion Studies of the Thermal Decomposition of Magnesium and Calcium Sulfates J. Chem. Phys. 1977, 66, 4532-6539.
-
(1977)
J. Chem. Phys.
, vol.66
, pp. 4532-6539
-
-
Lau, K.H.1
Cubicciotti, D.2
Hildenbrand, D.L.3
-
12
-
-
79952620205
-
-
Strem Chemicals, Inc., 1999, Catalog No. 18
-
Strem Chemicals, Inc., 1999, Catalog No. 18.
-
-
-
-
13
-
-
0005024166
-
Standard enthalpies of formation of Bis(Pentane-2,4-Dionato)Cu(II) and of four bis-(methyl-substituted heptane-3,5-Dionato)Cu(II) complexes: The mean (Cu-O) bond-dissociation enthalpies
-
Ribeiro da Silva, M. A. V.; Ribeiro da Silva, M. D. M. C.; Carvalho, A. P. S. M. C.; Akello, M. J.; Pilcher, G. Standard Enthalpies of Formation of Bis(Pentane-2,4-Dionato)Cu(II) and of Four Bis-(Methyl-Substituted Heptane-3,5-Dionato)Cu(II) Complexes: the Mean (Cu-O) Bond-Dissociation Enthalpies. J. Chem. Thermodyn. 1984, 16, 137-144.
-
(1984)
J. Chem. Thermodyn.
, vol.16
, pp. 137-144
-
-
Da Silva, R.M.A.V.1
Da Silva, R.M.D.M.C.2
Carvalho, A.P.S.M.C.3
Akello, M.J.4
Pilcher, G.5
-
14
-
-
0029252369
-
Low-temperature vapor pressures of W-, Cr-, and Co-carbonyls
-
Garner, M. L.; Chandra, D.; Lau, K. H. Low-Temperature Vapor Pressures of W-, Cr-, and Co-Carbonyls. J. Phase Equilibr. 1995, 16, 24.
-
(1995)
J. Phase Equilibr.
, vol.16
, pp. 24
-
-
Garner, M.L.1
Chandra, D.2
Lau, K.H.3
-
15
-
-
79952615972
-
-
Lau, K. H.; Colominas, C.; Hildenbrand, D. L.; Crouch-Baker, S.; Sanjurjo, A., to be published
-
Lau, K. H.; Colominas, C.; Hildenbrand, D. L.; Crouch-Baker, S.; Sanjurjo, A., to be published.
-
-
-
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