C+-damaged diamond: Electrical measurements after rapid themal annealing to 500°C

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 463-468

  Prins, Johan F ^a  

^a UNIVERSITY OF PRETORIA   (South Africa)

Author keywords

Diamond; Graphitisation; Ion implantation; Radiation damage

Indexed keywords

COMPUTER SIMULATION; COMPUTER SOFTWARE; ELECTRICAL ENGINEERING; ION IMPLANTATION; NITROGEN; RAPID THERMAL ANNEALING;

ELECTRICAL MEASUREMENTS;

DIAMONDS;

DIAMOND;

EID: 0035271162     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00538-0     Document Type: Article

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