Electrical properties and thermodynamic stability of Sr(Ti1-x,Rux)O3 thin films deposited by inductive-coupling-plasma-induced RF magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 3 A, 2001, Pages 1384-1387

  Ohara, Ryoichi ^a   Schimizu, Tatsuo ^a   Sano, Kenya ^a   Yoshiki, Masahiko ^a   Kawakubo, Takashi ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Conductive oxides; Electrical conductivity; Perovskite oxides; SrRuO3; SrTiO3; Thermodynamic stability

Indexed keywords

ELECTRIC CONDUCTIVITY; ENERGY GAP; EPITAXIAL GROWTH; GROUND STATE; INDUCTIVELY COUPLED PLASMA; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; STRONTIUM COMPOUNDS; SUBSTRATES; THERMODYNAMIC STABILITY; X RAY PHOTOELECTRON SPECTROSCOPY;

CONDUCTIVE OXIDES;

THIN FILMS;

EID: 0035270441     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.1384     Document Type: Article

References (12)