Properties of aluminium nitride coating obtained by vacuum arc discharge method with plasma flow separation

Diamond and Related Materials

Volumn 10, Issue 3-7, 2001, Pages 1314-1316

  Inkin, V N ^a   Kirpilenko, G G ^a   Kolpakov, A J ^a  

^a Patinor Coatings Ltd   (Russian Federation)

Author keywords

Aluminium nitride; Filtered cathodic vacuum arc; Properties

Indexed keywords

ADHESION; COATINGS; CRYSTAL LATTICES; CRYSTAL STRUCTURE; ELECTRON DIFFRACTION; FILTRATION; MICROHARDNESS; NITROGEN; PLASMA FLOW; STAINLESS STEEL; X RAYS;

VACUUM CHAMBER;

ALUMINUM NITRIDE;

ALUMINUM NITRIDE;

EID: 0035270018     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00577-X     Document Type: Article

References (3)

1. Kosolapova T.J., Andreeva T.V., Bartnitskaya T.S. Non-metal refractory compositions. Metallurgy. 2:1985;224. in Russian.
2. Gerova E.V., Ivanov N.A., Kirov K.J. Deposition of AlN thin-films by magnetron reactive sputtering. Thin Solid Films. 86:(2):1981;201-206.
3. A.J. Kolpakov, V.N. Inkin, G.G. Kirpilenko, Device for coating deposition in vacuum, Patent to be published in Russian, application number 99127837 dated 17.01.2000.