Fabrication of SIS junctions for space borne submillimeter wave mixers using negative resist e-beam lithography

IEEE Transactions on Applied Superconductivity

Volumn 11, Issue 1 I, 2001, Pages 377-380

  Péron, Isabelle ^a   Pasturel, Patrice ^a   Schuster, Karl Friedrich ^a  

^a IRAM   (France)

Author keywords

Lithography; Material processing; Nanotechnology; Superconducting devices

Indexed keywords

FOURIER TRANSFORM SPECTROMETER; NEGATIVE RESIST ELECTRONBEAM LITHOGRAPHY; SELF-ALIGNED LIFT-OFF PROCESS; SUPERCONDUCTOR-INSULATOR-SUPERCONDUCTOR MIXERS;

ALUMINUM COMPOUNDS; CURRENT DENSITY; DIELECTRIC FILMS; ELECTRON BEAM LITHOGRAPHY; INTEGRATED CIRCUITS; NIOBIUM; SPECTROMETERS; SPUTTER DEPOSITION;

TUNNEL JUNCTIONS;

EID: 0035268838     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.919361     Document Type: Conference Paper

References (12)

1. The HIFI heterodyne instrument for FIRST: Capabilities and performance
2. Design of a fixed-tuned 30% bandwidth SIS receiver for FIRST/HIFI band 1 (480-640 GHz) and other space applications
3. Description of the IRAM standard process for Nb/Al-AlOx/Nb junctions as a guideline for junction and matching circuit design
4. NbN tunnel junctions
5. Supraleitende submikrometer Nb-tunnelkontakte für frequenzmischer in radioastronomischen empfângern
6. 4 membrane
7. E-beam SIS junction fabrication using CMP and e-beam defined wiring layer
8. High quality refractory Josephson tunnel junctions utilizing thin aluminium layers
9. Self-aligned contact process for Nb/Al-AlOx/Nb Josephson junctions
10. Characterization of Nb/AlOx-Al/Nb Josephson junctions by anodization profiles