Nanoscale SNS junction fabrication in superconductor-normal metal bilayers

IEEE Transactions on Applied Superconductivity

Volumn 11, Issue 1 I, 2001, Pages 1126-1129

  Hadfield, Robert H ^a,b   Burnell, Gavin ^a,b   Booij, Wilfred E ^a,b,c   Lloyd, Stephen J ^a,b   Moseley, Richard W ^a,b   Blamire, Mark G ^a,b  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^b Agilem Technologies ^*  (United Kingdom)

^c AGILENT TECHNOLOGIES   (United Kingdom)

Author keywords

Arrays; Focused ion beam; Nanotechnology; SNS devices; Superconducting devices

Indexed keywords

CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC RESISTANCE MEASUREMENT; ION BEAM ASSISTED DEPOSITION; JOSEPHSON JUNCTION DEVICES; NANOTECHNOLOGY; TRANSMISSION ELECTRON MICROSCOPY; VOLTAGE MEASUREMENT;

FOCUSED ION BEAM MICROSCOPE; METAL BILAYERS; NANOSCALE JUNCTION FABRICATION; SEMICONDUCTOR NORMAL METAL SUPERCONDUCTOR;

SUPERCONDUCTING DEVICES;

EID: 0035268366     PISSN: 10518223     EISSN: None     Source Type: Journal    
DOI: 10.1109/77.919546     Document Type: Conference Paper

References (11)

1. Superconductor-normal-superconductor microbridges: Fabrication, electrical behavior and modeling
2. Superconducting weak links
3. Stationary properties of high-critical-temperature proximity effect Josephson junctions
4. Real time resistometric depth monitoring in the focussed ion beam
5. Direct writing of low Tc superconductor-normal metal-superconductor junctions using a focused ion beam
6. Niobium-copper superconductor-normal metal-superconductor asymmetry modulated SQUIDs