Development of self-heating microreactor for catalytic reactions

Journal of Chemical Engineering of Japan

Volumn 34, Issue 3, 2001, Pages 441-443

  Kusakabe, Katsuki ^a   Miyagawa, Daigo ^a   Gu, Yunfeng ^a   Maeda, Hideaki ^b   Morooka, Shigeharu ^a  

^a KYUSHU UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Catalytic reactions; Microreactor; Photolithography; Silicon water; Wet etching

Indexed keywords

BENZENE; ETCHING; HYDROGENATION; PHOTORESISTORS; PLATINUM; SILICON WAFERS; SPUTTERING; THERMOCOUPLES;

MICROREACTORS;

CATALYSIS;

CHEMICAL REACTOR; SILICON;

EID: 0035266384     PISSN: 00219592     EISSN: None     Source Type: Journal    
DOI: 10.1252/jcej.34.441     Document Type: Article

References (8)

1. Development of a microreactor for chemical production
2. Simulation of micromachined chemical reactors for heterogeneous partial oxidation reactions
3. State-of-the-art in microreaction technology: Concepts, manufacturing and applications
4. Chip-based microsystems for genomic and proteomic analysis
5. Micromachined reactors for catalytic partial oxidation reactions
6. Preparation of a catalytic reactor composed of a microchannel etched on a silicon wafer