Time variations of organic compound concentrations in a newly constructed cleanroom

Journal of the IEST

Volumn 44, Issue 2, 2001, Pages 23-29

  Inoue, Chiyo ^a   Mizuno, Naoya ^b   Ogura, Satoshi ^b   Hanayama, Yuichiro ^a   Hattori, Shinji ^a   Endo, Katsuyoshi ^c,d   Yasutake, Kiyoshi ^c   Morita, Mizuho ^c   Mori, Yuzo ^c  

^a Takuma Co Ltd   (Japan)

^b Kankyo Sol Tech Co Ltd   (Japan)

^c OSAKA UNIVERSITY   (Japan)

^d KYOTO UNIVERSITY   (Japan)

Author keywords

Cleanroom; Construction materials; Organic compounds; Outgassing; Semiconductor

Indexed keywords

BUILDING MATERIALS; CLEAN ROOMS; DEGASSING; GAS CHROMATOGRAPHY; MASS SPECTROMETERS; ORGANIC COMPOUNDS; PLASTICIZERS;

GAS CHROMATOGRAPH MASS SPECTROMETER; ORGANIC COMPOUND CONCENTRATIONS; ORGANIC OUTGASSING RATES;

CONTAMINATION;

EID: 0035266383     PISSN: 10984321     EISSN: None     Source Type: Journal    
DOI: 10.17764/jiet.44.2.7r476u464m81r225     Document Type: Article

References (6)

1. Chemical Contamination Reducing in Environment of Semiconductor Manufacturing Processes (Saiki, A. Ed.), Realize Inc., Tokyo (1997). (in Japanese)
2. Ro, T., Ishiguro, T., Takahashi, M., and Haga, H., Proceedings of the 15th Annual Technical Meeting on Air Cleaning and Contamination Control, pp. 57-60 (1997).
3. Shiramizu, Y., and Kitajima, H., Proceedings of the 1995 International Conference on Solid State Devices and Materials, Osaka, pp. 273-275 (1995).
4. Takeda, K., Nonaka, Sakamoto, Y., Taira, T., Hirono, K., Sado, M., Suwa, N., Ohtsuka, K., and Fujimoto, T., Proceedings of the 15th Annual Technical Meeting on Air Cleaning and Contamination Control, pp. 5-8 (1997)
5. Kajima, T., Suzuki, Y., and Yatsuyanagi, Y., Proceedings of the 15th Annual Technical Meeting on Air Cleaning and Contamination Control, pp. 13-16 (1997).
6. The Japan Machinery Federation and The Japan Society of Industrial Machinery Manufacture, "Report on the optimum structure of cleanroom for energy saving and low cost," (1995).