CVD technologies used in preparation of low dielectric constant materials for ULSI

Weixi Jiagong Jishu/Microfabrication Technology

Volumn , Issue 1, 2001, Pages 30-

  Wang, P F ^a   Ding, S J ^a   Zhang, W ^a   Wang, J T ^a   Li, W ^a  

^a NONE

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EID: 0035265088     PISSN: 10038213     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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