Depth dependence of hardness in copper single crystals measured by nanoindentation

Scripta Materialia

Volumn 44, Issue 2, 2001, Pages 237-241

  Liu, Y ^a   Ngan, A H W ^a  

^a UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELECTROLYTIC POLISHING; HARDNESS; MATHEMATICAL MODELS; NANOTECHNOLOGY; SINGLE CRYSTALS; SURFACE TOPOGRAPHY; VECTORS;

NANOINDENTATION;

COPPER;

EID: 0035252466     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(00)00598-4     Document Type: Article

References (11)

1. Pethica J.B., Hutchings R., Oliver W.C. Phil. Mag. A. 48:1983;593.
2. Doerner M.F., Nix W.D. J. Mater. Res. 1:1986;601.
3. Doerner M.F., Gardner D.S., Nix W.D. J. Mater. Res. 1:1986;845.
4. Oliver W.C., Pharr G.M. J. Mater. Res. 7:1992;1564.
5. Gane N., Cox J.M. Phil. Mag. 22:1970;881.
6. Ma Q., Clarke D.R. J. Mater. Res. 10:1995;853.
7. Stelmashenko N.A., Walls M.G., Brown L.M., Milman Y.V. Acta Metall. Mater. 41:1993;2855.
8. McElhaney K.W., Vlassak J.J., Nix W.D. J. Mater. Res. 13:1998;1300.
9. Nix W.D., Gao H. J. Mech. Phys. Solids. 46:1998;411.
10. Lim Y.Y., Chaudhri M.M. Phil. Mag. A. 79:1999;2979.
11. Fleck N.A., Muller G.M., Ashby M.F., Hutchinson J.W. Acta Metall. Mater. 42:1994;475.